Characterization of Zinc Oxide Thin Films for Gas Sensing Applications through Sputter Deposition and Thermal Annealing
IR@CEERI: CSIR-Central Electronics Engineering Research Institute, Pilani
View Archive Info| Field | Value | |
| Title |
Characterization of Zinc Oxide Thin Films for Gas
Sensing Applications through Sputter Deposition and
Thermal Annealing
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| Creator |
Dwivedi, M
Mudgal, T Srivastav, SR Komal, J Bhargava, AK Sharma, AK Vyas, V Eranna, G |
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| Subject |
Sensors and Nanotechnology
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| Description |
ZnO is a strategic material for various sensing application.
We have deposited the thin film of zinc oxide (ZnO) on silicon
dioxide (SiO2) substrates from room temperature using Radio
frequency (RF) magnetron sputtering method. We present our
results on characterization of these thin films of ZnO
deposited by RF sputtering and post annealing methods. The
characterization techniques involved, X-Ray Diffraction
(XRD) and energy dispersive X-ray (EDX). ZnO thin films
by sputter have been annealed at different temperatures from
2000C to 4000C for gas sensing applications.
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| Date |
2013
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| Type |
Conference or Workshop Item
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://ceeri.csircentral.net/60/1/29_2012%287%29.pdf
Dwivedi, M and Mudgal, T and Srivastav, SR and Komal, J and Bhargava, AK and Sharma, AK and Vyas, V and Eranna, G (2013) Characterization of Zinc Oxide Thin Films for Gas Sensing Applications through Sputter Deposition and Thermal Annealing. In: International Conference on Emerging Technologies : Micro to Nano 2013 (ETMN-2013), February 23-24, 2013, BITS, Pilani, K.K. Birla Goa Campus, Goa. (Submitted) |
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| Relation |
http://ceeri.csircentral.net/60/
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