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Silicon Micromachined K-band Filters

IR@CEERI: CSIR-Central Electronics Engineering Research Institute, Pilani

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Field Value
 
Title Silicon Micromachined K-band Filters
 
Creator Khandelwal, SK
Bansal, D
Rangra, KJ
 
Subject Sensors and Nanotechnology
 
Description This paper describes a substrate integrated waveguide (SIW) based filter at K band frequency on silicon substrate. TMAH etching is used to form the via-holes for SIW cavities. Simulations and comparison of TMAH and inductively coupled plasma (ICP) etched cavity has been presented. A micro- machined filter is made from rectangular cavities integrated into a silicon substrate and is fed by coplanar waveguide (CPW) transmission-lines through current probes. Simulated filter using TMAH etching shows insertion loss of 0.29dB and return loss of 21.96 dB.
 
Date 2012
 
Type Conference or Workshop Item
PeerReviewed
 
Format application/pdf
 
Identifier http://ceeri.csircentral.net/204/1/51_2011%281%29.pdf
Khandelwal, SK and Bansal, D and Rangra, KJ (2012) Silicon Micromachined K-band Filters. In: International Conference on Computing, Electronics and Electrical Technologies (ICCEETS - 2012), March 21 - 22, 2012, Kanyakumari, India. (Submitted)
 
Relation http://ceeri.csircentral.net/204/