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NO2 gas sensing performance of Ag-WO3-x thin films prepared by reactive magnetron sputtering process

IR@CGCRI: CSIR-Central Glass and Ceramic Research Institute, Kolkata

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Title NO2 gas sensing performance of Ag-WO3-x thin films prepared by reactive magnetron sputtering process
 
Creator Hossain, Modassar
Sarkar, Krishnendu
Mondal, Arnab
Bag, Ankush
Kuiri, Probodh Kumar
Roopa, .
Kumar, M. Senthil
Bysakh, Sandip
Pal, Prabir
 
Subject Electronics
 
Description We have demonstrated a comparative study of NO2 gas sensing behavior of reactive sputtered growth WO3-x nanocrystalline thin films and its functionalization with Ag nanoparticles (Ag-WO3-x) on Si/SiO2 substrates. X-ray diffraction and transmission electron microscope characterizations demonstrate the formation of polycrystalline monoclinic phase of porous WO3-x thin film. X-ray photoelectron spectroscopy experiments reveal that W6+ charge state has higher concentration compared with that of W4+ and W5+. The Ag-WO(3-x )films exhibit a sensitivity of about 70% at 10 ppm, while WO3-x films show 12%, measured at 225(degrees)C with same NO2 gas concentration. The response and recovery time are 2 and 3 min. for Ag-WO3-x films, while these for WO(3-x )films are 3 and 4 min., respectively. This work shows that nano-scale dendritic agglomeration growth of Ag nanoparticles on WO3-x surface can increase active sites for NO2 gas and play an important role in trace-level gas sensing performance.
 
Publisher Springer
 
Date 2023-12
 
Type Article
PeerReviewed
 
Format application/pdf
 
Identifier http://cgcri.csircentral.net/5669/1/bysakh.pdf
Hossain, Modassar and Sarkar, Krishnendu and Mondal, Arnab and Bag, Ankush and Kuiri, Probodh Kumar and Roopa, . and Kumar, M. Senthil and Bysakh, Sandip and Pal, Prabir (2023) NO2 gas sensing performance of Ag-WO3-x thin films prepared by reactive magnetron sputtering process. Applied Physics A-Materials Science & Processing, 129 (12). Art No-866. ISSN 0947-8396
 
Relation http://cgcri.csircentral.net/5669/