Growth of nanostructured TiN/NbN superlattice coatings by DC reactive sputtering process
IR@NAL: CSIR-National Aerospace Laboratories, Bangalore
View Archive Info| Field | Value | |
| Title |
Growth of nanostructured TiN/NbN superlattice coatings by DC reactive sputtering process
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| Creator |
Barshilia, Harish C
Rajam, KS |
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| Subject |
Chemistry and Materials (General)
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| Description |
Single layer TiN and NbN coatings were deposited on Si (111) and tool steel substrates using a reactive DC magnetron sputtering process. Process parameters were controlled in such a way that cubic phases of TiN and NbN with B1 structure were formed. Subsequently, TiN/NbN multilayer coatings were deposited at various modulation wavelengths (), that is the bilayer thicknesses. X-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) were used to characterize the coatings. Multilayer coatings deposited at 120 Å > > 25 Å showed satellite reflections along (111) principal reflection, thus confirming the formation of superlattice structure. The multilayer coatings exhibited hardness as high as ~4000 kg/mm2, which was about 2 times the rule-of-mixtures value. The AFM images showed that the coatings had a roughness of ~5 nm.
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| Publisher |
Narosa Publishing House
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| Contributor |
Bahadur, D
Vitta, S Prakash, O |
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| Date |
2004
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| Type |
Book / Book Chapter
PeerReviewed |
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| Identifier |
Barshilia, Harish C and Rajam, KS (2004) Growth of nanostructured TiN/NbN superlattice coatings by DC reactive sputtering process. In: Inorganic Materials: Recent Advances. Narosa Publishing House, p. 427.
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| Relation |
http://nal-ir.nal.res.in/9823/
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