Indigenous development of a four-cathode reactive direct current unbalanced magnetron sputtering system for the deposition of hard coatings on small engineering components
IR@NAL: CSIR-National Aerospace Laboratories, Bangalore
View Archive Info| Field | Value | |
| Title |
Indigenous development of a four-cathode reactive direct current unbalanced magnetron sputtering system for the deposition of hard coatings on small engineering components
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| Creator |
Barshilia, Harish C
Khan, Jakeer Rajam, KS |
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| Subject |
Chemistry and Materials (General)
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| Description |
Physical vapor deposited hard coatings are routinely being used in many industrial applications. These coatings are mainly deposited using sputtering methods. The commercial sputtering systems are highly expensive. NAL has developed a cost effective semi-industrial magnetron sputtering system to deposit a variety of thin coatings on small engineering components. Using the design inputs given by NAL, a local firm has fabricated a custom-built unbalanced magnetron sputtering facility. This equipment consists of state-of-the-art technologies and sophistication. The indigenous fabrication has resulted in huge savings. The sputtering system has been successfully installed and commissioned in the laboratory and is working satisfactorily. With this system it is possible to deposit thin coatings of various materials on a sample size of 666.
This report describes all the technical details of the sputtering system. We discuss in detail various technical problems in designing such kind of sputtering system. Also, presented in the report are the preliminary results of TiN coatings deposited on a variety of small engineering components. Finally, we present the potential applications of the sputtering system for the deposition of hard coatings, nanolayered multilayer coatings, nanocomposite coatings, oxide coatings, magnetic multilayers, smart materials, duplex coatings, gradient coatings, solid lubricant coatings, magnetic thin films, etc.
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| Publisher |
NAL
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| Date |
2006
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| Type |
Proj.Doc/Technical Report
NonPeerReviewed |
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| Identifier |
Barshilia, Harish C and Khan, Jakeer and Rajam, KS (2006) Indigenous development of a four-cathode reactive direct current unbalanced magnetron sputtering system for the deposition of hard coatings on small engineering components. Project Report. NAL.
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| Relation |
http://nal-ir.nal.res.in/9825/
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