Effect of substrate temperature on the structural properties of magnetron sputtered titanium nitride thin films with brush plated nickel interlayer on mild steel
IR@CECRI: CSIR-Central Electrochemical Research Institute, Karaikudi
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Title |
Effect of substrate temperature on the structural properties of magnetron
sputtered titanium nitride thin films with brush plated nickel interlayer
on mild steel
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Creator |
Subramanian, B.
Ashok, K. Jayachandran, M. |
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Subject |
Electrochemical Materials Science
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Description |
Thin films of titanium nitride (TiN) were prepared on mild steel (MS) by a physical vapor deposition (PVD)
method namely direct current reactivemagnetron sputtering. With the aim of improving the adhesion of
TiN layer an additional Nickel interlayer was brush plated on the steel substrates prior to TiN film
formation. The phase has been identified with X-ray diffraction (XRD) analysis, and the results show that
the prominent peaks observed in the diffraction patterns correspond to the (1 1 1), (2 0 0) and (2 2 2)
planes of TiN. Cross-sectional SEM indicated the presence of dense columnar structure. The mechanical
properties (modulus and hardness) of these films were characterized by nanoindentation.
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Publisher |
Elsevier B.V.
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Date |
2008
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Type |
Article
PeerReviewed |
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Format |
application/pdf
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Identifier |
http://cecri.csircentral.net/4/1/004-2008.pdf
Subramanian, B. and Ashok, K. and Jayachandran, M. (2008) Effect of substrate temperature on the structural properties of magnetron sputtered titanium nitride thin films with brush plated nickel interlayer on mild steel. Applied Surface Science, 255 (5). pp. 2133-2138. |
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Relation |
http://cecri.csircentral.net/4/
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