Characterization of reactive DC magnetron sputtered TiAlN thin films
IR@CECRI: CSIR-Central Electrochemical Research Institute, Karaikudi
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Title |
Characterization of reactive DC magnetron sputtered TiAlN thin films
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Creator |
Subramanian, B.
Ashok, K. Kuppusami, P. Sanjeeviraja, C. Jayachandran, M. |
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Subject |
Electrochemical Materials Science
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Description |
Thin films of about 1μm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by
reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and
aluminum. X-ray diffraction (XRD) analysis showed that the TiAlN phase had preferred orientations along
111 and 200 with the face-centered cubic structure. Scanning Electron Microscope (SEM) and Atomic Force
Microscope (AFM) analyses indicated that the films were uniform and compact. Photoluminescence (PL)
spectra reveal that TiAlN thin films are of good optical quality. Laser Raman studies revealed the presence of
characteristic peaks of TiAlN at 312.5, 675, and 1187.5 cm–1.
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Publisher |
WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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Date |
2008
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Type |
Article
PeerReviewed |
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Format |
application/pdf
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Identifier |
http://cecri.csircentral.net/74/1/025-2008.pdf
Subramanian, B. and Ashok, K. and Kuppusami, P. and Sanjeeviraja, C. and Jayachandran, M. (2008) Characterization of reactive DC magnetron sputtered TiAlN thin films. Cryst. Res. Technol., 43 (10). pp. 1078-1082. |
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Relation |
http://cecri.csircentral.net/74/
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