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Characterization of reactive DC magnetron sputtered TiAlN thin films

IR@CECRI: CSIR-Central Electrochemical Research Institute, Karaikudi

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Title Characterization of reactive DC magnetron sputtered TiAlN thin films
 
Creator Subramanian, B.
Ashok, K.
Kuppusami, P.
Sanjeeviraja, C.
Jayachandran, M.
 
Subject Electrochemical Materials Science
 
Description Thin films of about 1μm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X-ray diffraction (XRD) analysis showed that the TiAlN phase had preferred orientations along 111 and 200 with the face-centered cubic structure. Scanning Electron Microscope (SEM) and Atomic Force Microscope (AFM) analyses indicated that the films were uniform and compact. Photoluminescence (PL) spectra reveal that TiAlN thin films are of good optical quality. Laser Raman studies revealed the presence of characteristic peaks of TiAlN at 312.5, 675, and 1187.5 cm–1.
 
Publisher WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
 
Date 2008
 
Type Article
PeerReviewed
 
Format application/pdf
 
Identifier http://cecri.csircentral.net/74/1/025-2008.pdf
Subramanian, B. and Ashok, K. and Kuppusami, P. and Sanjeeviraja, C. and Jayachandran, M. (2008) Characterization of reactive DC magnetron sputtered TiAlN thin films. Cryst. Res. Technol., 43 (10). pp. 1078-1082.
 
Relation http://cecri.csircentral.net/74/