Deposition of nanocrystalline CuS thin film from a single precursor: Structural, optical and electrical properties
IR@CGCRI: CSIR-Central Glass and Ceramic Research Institute, Kolkata
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Title |
Deposition of nanocrystalline CuS thin film from a single precursor: Structural, optical and electrical properties
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Creator |
Maji, Swarup Kumar
Mukherjee, Nillohit Dutta, Amit Kumar Srivastava, Divesh N. Paul, Parimal Karmakar, Basudeb Mondal, Anup Adhikary, Bibhutosh |
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Subject |
Processing Science
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Description |
Nanocrystalline CuS thin films were fabricated using a metal organic deposition technique taking Cu(SOCCH(3))(2)Lut(2) as the precursor. X-ray diffraction (XRD) technique, field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), UV-vis absorption spectroscopy, photoluminescence spectroscopy (PL) and Raman spectroscopic techniques were applied for characterization and found that the deposited CuS films were of `covellite' phase with an average particle size of 18 nm. Optical measurements showed significant amount of ``blue shift'' in the band gap energy. Hall measurements of the films showed p-type conduction nature with a carrier concentration in the range 10(12)-10(13) cm(-3).
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Publisher |
Elsevier
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Date |
2011-10
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Type |
Article
PeerReviewed |
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Format |
application/pdf
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Identifier |
http://cgcri.csircentral.net/284/1/Mater_ChemPhys_130_(2011)_392%E2%80%93397.pdf
Maji, Swarup Kumar and Mukherjee, Nillohit and Dutta, Amit Kumar and Srivastava, Divesh N. and Paul, Parimal and Karmakar, Basudeb and Mondal, Anup and Adhikary, Bibhutosh (2011) Deposition of nanocrystalline CuS thin film from a single precursor: Structural, optical and electrical properties. Materials Chemistry and Physics, 130 (1-2). pp. 392-397. ISSN 0254-0584 |
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Relation |
http://cgcri.csircentral.net/284/
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