Effect of high substrate bias and hydrogen and nitrogen incorporation on spectroscopic ellipsometric and atomic force microscopic studies of tetrahedral amorphous carbon films
IR@NPL: CSIR-National Physical Laboratory, New Delhi
View Archive Info| Field | Value | |
| Title |
Effect of high substrate bias and hydrogen and nitrogen incorporation on spectroscopic ellipsometric and atomic force microscopic studies of tetrahedral amorphous carbon films
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| Creator |
Panwar, O. S.
Khan, M. A. Kumar, Satyendra Basu, A. Mehta , B. R. Kumar, Sushil -, Ishpal |
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| Subject |
Materials Science
Physics |
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| Description |
The influence of substrate bias and hydrogen/nitrogen incorporation on the optical properties [studied by spectroscopic ellipsometry (SE)] and surface morphology [studied by atomic force microscopy] of tetrahedral amorphous carbon (ta-C) films, deposited by S bend filtered cathodic vacuum arc (FCVA) process, is reported. SE spectra of the imaginary part of the dielectric constant are used to estimate carbon bonding ratios. In ta-C films, optical constants increase with substrate bias and hydrogen/nitrogen incorporation. The optical band gap (Eg) and sp3 content increase up to −200 V substrate bias and then decrease. Eg increases with hydrogen incorporation but is unchanged by nitrogen incorporation.
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| Publisher |
Elsevier
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| Date |
2010-08-28
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| Type |
Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://npl.csircentral.net/98/1/73.pdf
Panwar, O. S. and Khan, M. A. and Kumar, Satyendra and Basu, A. and Mehta , B. R. and Kumar, Sushil and -, Ishpal (2010) Effect of high substrate bias and hydrogen and nitrogen incorporation on spectroscopic ellipsometric and atomic force microscopic studies of tetrahedral amorphous carbon films. Surface & Coatings Technology, 205 (7). pp. 2126-2133. ISSN 0257-8972 |
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| Relation |
http://dx.doi.org/10.1016/j.surfcoat.2010.08.119
http://npl.csircentral.net/98/ |
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