Electrodeposition of nickel on boron-doped diamond from an air-stable methyl sulphate anion based ionic liquid
IR@CECRI: CSIR-Central Electrochemical Research Institute, Karaikudi
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Title |
Electrodeposition of nickel on boron-doped diamond from an
air-stable methyl sulphate anion based ionic liquid
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Creator |
Saravanan, KR.
Sathyamoorthi, S. Velayutham, D. Suryanarayanan, V. |
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Subject |
Electrodeposition
Electroorganic |
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Description |
Electrodeposition of nickel had been successfully carried out for the first time in the ionic liquid triethylmethylammonium
methyl sulphate (TEMAMS) on boron-doped diamond (BDD) along with glassy
carbon electrode (GC). The electrochemical reduction of Ni (II) ions takes place slightly at a more positive
potential on the BDD than the GC in this medium. The nickel deposition proceeds via three-dimensional
instantaneous nucleation on the BDD and progressive on the GC. Surface morphologic characteristics of
Ni deposits obtained on the BDD and GC at different deposition potentials were characterised by SEM
and AFM
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Publisher |
Elsevier
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Date |
2013
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Type |
Article
PeerReviewed |
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Format |
application/pdf
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Identifier |
http://cecri.csircentral.net/3027/1/013-2013.pdf
Saravanan, KR. and Sathyamoorthi, S. and Velayutham, D. and Suryanarayanan, V. (2013) Electrodeposition of nickel on boron-doped diamond from an air-stable methyl sulphate anion based ionic liquid. Electrochimica Acta, 98. pp. 88-93. ISSN 0013-4686 |
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Relation |
http://www.elsevier.com/locate/electacta
http://cecri.csircentral.net/3027/ |
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