Analysis of the thickness dependence of critical current density for electrophoretically deposited YBa2Cu3O7-x films
IR@CGCRI: CSIR-Central Glass and Ceramic Research Institute, Kolkata
View Archive Info| Field | Value | |
| Title |
Analysis of the thickness dependence of critical current density for electrophoretically deposited YBa2Cu3O7-x films
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| Creator |
Bhattacharya, Dipten
Choudhury, Pranab Roy, Soumendra Nath Maiti, Himadri Sekhar |
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| Subject |
Electronics
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| Description |
An attempt has been made to explain the experimental observations regarding variation of critical current density with the film thickness between 3 and 65 mum in electrophoretically deposited YBa2Cu3O7-x films on silver (Ag) substrates. It is not possible to explain the phenomenon using the commonly believed concept of self-field degradation of critical current density of weak links between the grains. On the other hand, an increased grain-boundary resistance due to a lesser degree of silver penetration from the substrate with increasing film thickness is proposed to be the cause of the observed degradation of critical current density. The experimental data agree quite well with those theoretically calculated.
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| Publisher |
American Institute of Physics
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| Date |
1994-07
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| Type |
Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://cgcri.csircentral.net/1952/1/bhattacharya1994.pdf
Bhattacharya, Dipten and Choudhury, Pranab and Roy, Soumendra Nath and Maiti, Himadri Sekhar (1994) Analysis of the thickness dependence of critical current density for electrophoretically deposited YBa2Cu3O7-x films. Journal of Applied Physics, 76 (2). pp. 1120-1123. ISSN 0021-8979 |
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| Relation |
http://cgcri.csircentral.net/1952/
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