Development of transparent and conducting indium tin oxide (ITO) thin films by reactive sputtering at low substrate temperature
IR@NAL: CSIR-National Aerospace Laboratories, Bangalore
View Archive Info| Field | Value | |
| Title |
Development of transparent and conducting indium tin oxide (ITO) thin films by reactive sputtering at low substrate temperature
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| Creator |
Sibin, K P
Swain, Niharika Dey, Arjun Sridhar, N Barshilia, Harish C |
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| Subject |
General
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| Description |
Transparent and conducting indium tin oxide (ITO) thin films were deposited on different substrates such as: glass, fluorinated ethylene propylene, Si, Kapton and aluminized Kapton by reactive sputtering at low substrate temperature. The effects of different deposition parameters such as target power, oxygen and argon flow rates, substrate temperature and deposition duration on the optical and electrical properties of ITO thin films have been studied. Optical and electrical properties of ITO thin films on different substrates were studied. The optimized ITO films were characterized using X-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy etc.
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| Publisher |
National Aerospace Laboratories
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| Date |
2014
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| Type |
Proj.Doc/Technical Report
NonPeerReviewed |
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| Identifier |
Sibin, K P and Swain, Niharika and Dey, Arjun and Sridhar, N and Barshilia, Harish C (2014) Development of transparent and conducting indium tin oxide (ITO) thin films by reactive sputtering at low substrate temperature. Project Report. National Aerospace Laboratories, Bangalore.
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| Relation |
http://nal-ir.nal.res.in/11966/
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