Influence of nitrogen flow rates on materials properties of CrNx films grown by reactive magnetron sputtering
IR@CECRI: CSIR-Central Electrochemical Research Institute, Karaikudi
View Archive Info| Field | Value | |
| Title |
Influence of nitrogen flow rates on materials properties of CrNx films
grown by reactive magnetron sputtering
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| Creator |
Subramanian, B.
Prabakaran, K. Jayachandran, M. |
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| Subject |
Electrochemical Materials Science
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| Description |
Chromium nitride (CrN) hard thin films were deposited on different substrates by reactive direct current
(d.c.) magnetron sputtering with different nitrogen flow rates. The X-ray diffraction patterns showed mixed Cr2N
and CrN phases. The variations in structural parameters are discussed. The grain size increased with increasing
nitrogen flow rates. Scanning electron microscopy image showed columnar and dense microstructure with varying
nitrogen flow rates. An elemental analysis of the samples was realized by means of energy dispersive spectroscopy.
The electrical studies indicated the semiconducting behaviour of the films at the nitrogen flow rate of 15 sccm
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| Publisher |
Indian Academy of Sciences.
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| Date |
2012
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| Type |
Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://cecri.csircentral.net/3111/1/061-2012.pdf
Subramanian, B. and Prabakaran, K. and Jayachandran, M. (2012) Influence of nitrogen flow rates on materials properties of CrNx films grown by reactive magnetron sputtering. Bulletin of Materials Science, 35 (4). pp. 505-511. ISSN 0250-4707 |
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| Relation |
http://cecri.csircentral.net/3111/
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