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Observation of large positive magneto-resistance in bubble decorated graphene oxide films derived from shellac biopolymer: a new carbon source and facile method for morphology-controlled properties†

IR@NML: CSIR-National Metallurgical Laboratory, Jamshedpur

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Title Observation of large positive magneto-resistance in bubble decorated graphene oxide films derived from shellac biopolymer: a new carbon source and facile method for morphology-controlled properties†
 
Creator Singhbabu, Y N
Choudhary, Shyam K
Shukla, N
Das, S
Sahu, Ranjan K
 
Subject Materials Science
 
Description We report a large positive magneto-resistance (MR) in bubble decorated graphene oxide films that are derived from shellac biopolymer as a carbon source. These films were produced on a quartz substrate by heating the biopolymer coated substrate at 900 °C in an argon atmosphere. The characterization data of the films using Raman, X-ray photoelectron spectroscopy, field emission scanning electron microscopy and transmission electron microscopy reveal that shellac can be used as a new carbon source to produce transparent bubble decorated graphene oxide films. The magneto-resistance results show a 130% change in the resistance of the films at 3 K under a perpendicular magnetic field of 15 T, and the value decreases exponentially up to 50 K. The observed MR properties of the bubble decorated graphene oxide films are explained using a weak anti-localization and quantum interference model in the low magnetic field region, while the Lorentz force accounts for the MR properties well in the high magnetic field region.
 
Publisher NCBI
 
Date 2015
 
Type Article
PeerReviewed
 
Format application/pdf
 
Identifier http://eprints.nmlindia.org/7227/1/YNSinghbabu-2015-Nanoscale.pdf
Singhbabu, Y N and Choudhary, Shyam K and Shukla, N and Das, S and Sahu, Ranjan K (2015) Observation of large positive magneto-resistance in bubble decorated graphene oxide films derived from shellac biopolymer: a new carbon source and facile method for morphology-controlled properties†. Nanoscale, 7 (IF-6.739). pp. 6510-6519.
 
Relation http://www.ncbi.nlm.nih.gov/pubmed/25788392
http://eprints.nmlindia.org/7227/