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Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of permalloy magnetic thin films

IR@NAL: CSIR-National Aerospace Laboratories, Bangalore

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Field Value
 
Title Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of permalloy magnetic thin films
 
Creator Khan, Jakeer
Selvakumar, N
Chowdhury, P
Barshilia, Harish C
 
Subject PHYSICS
 
Description We have designed and developed an indigenous ultra high vacuum (UHV) sputtering system which can deposit magnetic thin films with high purity and good uniformity. The equipment consists of state-of the-art technologies and sophistication. Turbo-molecular pump combined with sputter ion pump is used to pump down the vacuum chamber up to 10−10 to 10−11 mbar of pressure. With this system it is possible to deposit coatings of various materials on a sample size of diameter 3". The Ni81Fe19 ferromagnetic thin films, with Tantalum (Ta) as a buffer and cap layers have been deposited on silicon substrates using this ultra high vacuum (UHV) sputtering system. The magneto transport measurement study indicated a significant variation in the AMR values of the films for varying thicknesses of tantalum and NiFe layers.
 
Date 2012
 
Type Conference or Workshop Item
PeerReviewed
 
Format application/pdf
 
Identifier http://nal-ir.nal.res.in/12370/1/iop1.pdf
Khan, Jakeer and Selvakumar, N and Chowdhury, P and Barshilia, Harish C (2012) Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of permalloy magnetic thin films. In: International Symposium on Vacuum Science & Technology and its Application for Accelerators.
 
Relation http://iopscience.iop.org/article/10.1088/1742-6596/390/1/012081/pdf
http://nal-ir.nal.res.in/12370/