Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of permalloy magnetic thin films
IR@NAL: CSIR-National Aerospace Laboratories, Bangalore
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Title |
Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of permalloy magnetic thin films
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Creator |
Khan, Jakeer
Selvakumar, N Chowdhury, P Barshilia, Harish C |
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Subject |
PHYSICS
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Description |
We have designed and developed an indigenous ultra high vacuum (UHV) sputtering system which can deposit magnetic thin films with high purity and good uniformity. The equipment consists of state-of the-art technologies and sophistication. Turbo-molecular pump combined with sputter ion pump is used to pump down the vacuum chamber up to 10−10 to 10−11 mbar of pressure. With this system it is possible to deposit coatings of various materials on a sample size of diameter 3". The Ni81Fe19 ferromagnetic thin films, with Tantalum (Ta) as a buffer and cap layers have been deposited on silicon substrates using this ultra high vacuum (UHV) sputtering system. The magneto transport measurement study indicated a significant variation in the AMR values of the films for varying thicknesses of tantalum and NiFe layers.
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Date |
2012
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Type |
Conference or Workshop Item
PeerReviewed |
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Format |
application/pdf
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Identifier |
http://nal-ir.nal.res.in/12370/1/iop1.pdf
Khan, Jakeer and Selvakumar, N and Chowdhury, P and Barshilia, Harish C (2012) Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of permalloy magnetic thin films. In: International Symposium on Vacuum Science & Technology and its Application for Accelerators. |
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Relation |
http://iopscience.iop.org/article/10.1088/1742-6596/390/1/012081/pdf
http://nal-ir.nal.res.in/12370/ |
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