Microstructural studies of e-beam evaporated alumina thin films
IR@NAL: CSIR-National Aerospace Laboratories, Bangalore
View Archive Info| Field | Value | |
| Title |
Microstructural studies of e-beam evaporated alumina thin films
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| Creator |
Reddy, IN
Reddy, VR Dey, A Sridhara, N Basavaraja, S Bera, Parthasarathi Anandan, C Sharma, AK |
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| Subject |
Aeronautics (General)
Composite Materials |
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| Description |
Alumina thin films of different thicknesses, e.g. 90, 120 and 150 nm, were grown on SS304 thin foil by electron beam evaporation technique. The films were post-heat treated at 500, 700 and 800°C in air and subsequently characterised by X-ray diffraction, atomic force microscopy, field emission scanning electron microscopy and X-ray photoelectron spectroscopy. The effects of thicknesses and post-heat treatment on microstructure have been studied. The deposited alumina film was almost stoichiometric. The alumina film of the lowest thickness, i.e. 90 nm post-heat treated at 700°C, showed preferential growth of nanorods and irregular polygonal nanostructures with random orientation.
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| Publisher |
Taylor & Francis
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| Date |
2014-06-10
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| Type |
Journal Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://nal-ir.nal.res.in/12461/1/ja730.pdf
Reddy, IN and Reddy, VR and Dey, A and Sridhara, N and Basavaraja, S and Bera, Parthasarathi and Anandan, C and Sharma, AK (2014) Microstructural studies of e-beam evaporated alumina thin films. Surface Engineering, 30 (8). 594-599. ISSN 1743-2944 |
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| Relation |
http://dx.doi.org/10.1179/1743294414Y.0000000294
http://nal-ir.nal.res.in/12461/ |
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