Nanostructured Alumina Films by E-beams Evaporation
IR@NAL: CSIR-National Aerospace Laboratories, Bangalore
View Archive InfoField | Value | |
Title |
Nanostructured Alumina Films by E-beams Evaporation
|
|
Creator |
Reddy, IN
Sridhara, N Bera, Parthasarathi Anandan, C Sharma, AK Dey, Arjun |
|
Subject |
Aeronautics (General)
|
|
Description |
Deposition of alumina thin films with different thicknesses e.g. 90, 120 and 150 nm on titanium (Ti) thin foils was carried out by electron-beam evaporation technique at room temperature. As-grown films were annealed at 500, 700 and 800 °C in air. Further, phase, morphology and electronic structure of the as-grown and annealed thin films were investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and X-ray photoelectron spectroscopy (XPS) techniques, respectively. As-grown thin films are amorphous while the annealed thin films show crystalline peaks of different mixed phases of alumina as revealed by XRD. In addition, FESEM studies demonstrate different nanostructures e.g. fish-bone-like and nanorods in the thin films annealed at 700 and 800 °C, respectively.
|
|
Publisher |
ELSEVIER
|
|
Date |
2015-11
|
|
Type |
Journal Article
PeerReviewed |
|
Format |
application/pdf
|
|
Identifier |
http://nal-ir.nal.res.in/12465/1/ja734.pdf
Reddy, IN and Sridhara, N and Bera, Parthasarathi and Anandan, C and Sharma, AK and Dey, Arjun (2015) Nanostructured Alumina Films by E-beams Evaporation. Ceramics International, 41 (9, Par). pp. 10537-10546. ISSN 0272-8842 |
|
Relation |
http://dx.doi.org/10.1016/j.ceramint.2015.04.147
http://nal-ir.nal.res.in/12465/ |
|