Synthesis of Nanostructure Carbon Films Deposited by Microwave Plasma-Enhanced Chemical Vapor Deposition Technique at Room Temperature
IR@NPL: CSIR-National Physical Laboratory, New Delhi
View Archive Info| Field | Value | |
| Title |
Synthesis of Nanostructure Carbon Films Deposited by Microwave Plasma-Enhanced Chemical Vapor Deposition Technique at Room Temperature
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| Creator |
Bisht, Atul
Chockalingam, Sreekumar Panwar, O. S. Srivastava, A. K. Kesarwani, Ajay Kumar |
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| Subject |
Materials Science
Atomic and Molecular Physics Nanoscience/ Nanotechnology |
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| Description |
This paper reports the synthesis of nanostructure carbon (ns-carbon) films deposited by microwave plasma-enhanced chemical vapor deposition (MW PECVD) technique at low pressure and room temperature. ns-carbon films have been characterized by scanning electron microscopy, electron dispersive x-ray spectroscopic analysis, atomic force microscopy, Raman spectroscopy, X-ray diffraction, UV-visible spectroscopy and high-resolution transmission electron microscopy. The shape of nanostructure is changing from granular to sheet-like structure when the pressure increased from 55 to 110 mTorr.
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| Publisher |
Taylor & Francis
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| Date |
2015
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| Type |
Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://npl.csircentral.net/2034/1/340.pdf
Bisht, Atul and Chockalingam, Sreekumar and Panwar, O. S. and Srivastava, A. K. and Kesarwani, Ajay Kumar (2015) Synthesis of Nanostructure Carbon Films Deposited by Microwave Plasma-Enhanced Chemical Vapor Deposition Technique at Room Temperature. Fullerenes, Nanotubes and Carbon Nanostructures, 23 (5). 455 -462. ISSN 1536-383X |
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| Relation |
http://npl.csircentral.net/2034/
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