Effect of microstructure and stoichiometry on absorption in Mg intercalated MoO3 thin films
IR@NPL: CSIR-National Physical Laboratory, New Delhi
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| Title |
Effect of microstructure and stoichiometry on absorption in Mg intercalated MoO3 thin films
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| Creator |
Sian, T. S.
Reddy, G. B. Shivaprasad, S. M. |
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| Subject |
Electrochemistry
Materials Science |
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| Description |
Mg ions were intercalated in MoO3 films with different microstructure/ stoichiometry and the observed changes in absorption are explained in terms of the estimated diffusivity of Mg ions in these films. Optical studies on unintercalated and intercalated films revealed two absorption peaks at 850 and 1550 nm; first associated with Mo5+ states and the second with Mo4+ states. The changes in absorption with increasing intercalated fraction of ions (x) showed saturation behavior and the x value at which it occurred was found to be strongly dependent on microstructure/ stoichiometry. These changes are satisfactorily explained based on Mg ion diffusivity.
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| Publisher |
Electrochemical Society
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| Date |
2006
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| Type |
Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://npl.csircentral.net/2459/1/46.pdf
Sian, T. S. and Reddy, G. B. and Shivaprasad, S. M. (2006) Effect of microstructure and stoichiometry on absorption in Mg intercalated MoO3 thin films. Electrochemical and Solid-State Letters, 9 (3). A120-A122. ISSN 1099-0062 |
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| Relation |
http://npl.csircentral.net/2459/
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