Bipolar resistive switching in PVDF and Graphene Oxide heterostructure thin films
IR@NPL: CSIR-National Physical Laboratory, New Delhi
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| Title |
Bipolar resistive switching in PVDF and Graphene Oxide heterostructure thin films
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| Creator |
Thakre, Atul
Kumar, Ashok |
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| Subject |
Physical Chemistry
Materials Science Metallurgy & Metallurgical Engineering |
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| Description |
Resistive switching behavior in Graphene oxide (GO) is well studied, however, the various mechanisms responsible for this phenomenon are still under extensive debate. We present repeatable bipolar resistive switching in GO thin films sandwiched between two insulating polymer PVDF (Polyvinylidene Fluoride) grown on conducting indium tin oxide (ITO) covered glass substrate. The device heterostructure (Al/PVDF/GO/PVDF/ITO) showed bipolar resistance states switching between low resistance state (LRS) to high resistance state (HRS) with a large ON/OFF ratio of 10(3) and resistance retention potential up to 10(4) s. In LRS, in the low applied voltage region, ohmic conduction was the main reason for current conduction in devices; however, traps filled/assisted conduction mechanism dominates in the higher voltage region. The PVDF/GO/PVDF heterostructure shows that oxygen vacancies are responsible for the formation of current conducting filaments. The low operating voltage (< 3 V) and long-term stability of resistance states make it a promising candidate for possible applications as Resistive Random Access Memory (ReRAM) elements.
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| Publisher |
Elsevier
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| Date |
2017-10-25
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| Type |
Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://npl.csircentral.net/2626/1/Bipolar%20resistive%20switching%20in.pdf
Thakre, Atul and Kumar, Ashok (2017) Bipolar resistive switching in PVDF and Graphene Oxide heterostructure thin films. Journal of Alloys and Compounds, 722. pp. 579-584. ISSN 0925-8388 |
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| Relation |
http://npl.csircentral.net/2626/
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