Highly selective and reversible NO2 gas sensor using vertically aligned MoS2 flake networks
IR@NPL: CSIR-National Physical Laboratory, New Delhi
View Archive Info| Field | Value | |
| Title |
Highly selective and reversible NO2 gas sensor using vertically aligned MoS2 flake networks
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| Creator |
Kumar, Rahul
Kulriya, Pawan K. Mishra, Monu Singh, Fouran Gupta, Govind Kumar, Mahesh |
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| Subject |
Materials Science
Applied Physics/Condensed Matter Nanoscience/ Nanotechnology |
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| Description |
We demonstrate a highly selective and reversible NO2 resistive gas sensor using vertically aligned MoS2 (VA-MoS2) flake networks. We synthesized horizontally and vertically aligned MoS2 flakes on SiO2/Si substrate using a kinetically controlled rapid growth CVD process. Uniformly interconnected MoS2 flakes and their orientation were confirmed by scanning electron microscopy, x-ray diffraction, Raman spectroscopy and x-ray photoelectron spectroscopy. The VA-MoS2 gas sensor showed two times higher response to NO2 compared to horizontally aligned MoS2 at room temperature. Moreover, the sensors exhibited a dramatically improved complete recovery upon NO2 exposure at its low optimum operating temperatures (100 degrees C). In addition, the sensing performance of the sensors was investigated with exposure to various gases such as NH3, CO2, H-2, CH4 and H2S. It was observed that high response to gas directly correlates with the strong interaction of gas molecules on edge sites of the VA-MoS2. The VA-MoS2 gas sensor exhibited high response with good reversibility and selectivity towards NO2 as a result of the high aspect ratio as well as high adsorption energy on exposed edge sites.
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| Publisher |
IOP Publishing
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| Date |
2018-11-16
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| Type |
Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://npl.csircentral.net/3911/1/Highly%20selective%20and%20reversible.pdf
Kumar, Rahul and Kulriya, Pawan K. and Mishra, Monu and Singh, Fouran and Gupta, Govind and Kumar, Mahesh (2018) Highly selective and reversible NO2 gas sensor using vertically aligned MoS2 flake networks. Nanotechnology, 29 (46). pp. 464001-464010. ISSN 0957-4484 |
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| Relation |
http://npl.csircentral.net/3911/
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