Magnetic and magnetoresistance studies of the evolution of the magnetic layer structure with Co layer thickness in electrodeposited Co-Cu/Cu multilayers
IR@NPL: CSIR-National Physical Laboratory, New Delhi
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Title |
Magnetic and magnetoresistance studies of the evolution of the magnetic layer structure with Co layer thickness in electrodeposited Co-Cu/Cu multilayers
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Creator |
Ghosh, Subir Kumar
Chowdhury, Prashanta Dogra, Anjana |
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Subject |
Materials Science
Applied Physics/Condensed Matter |
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Description |
The structural transformation of electrochemically deposited Co-Cu/Cu multilayers with magnetic layer thickness was monitored via measurements of magnetization and magnetoresistance. For this, electrodeposition of [Co (t(Co) nm)/Cu (4 nm)](50) multilayers were carried out by varying the Co-layer thickness (t(Co)) down to 0.2 nm from a sulfate based single solution electrolyte. Magnetization measurements showed the appearance of anisotropy, increase in remanence magnetization and coercivity with systematic increase of t(Co) from 0.2 to 1 nm. Magnetic field direction dependent magnetoresistance (MR) measurements revealed that the isotropy in MR changes with t(Co) from tridimensional at 0.2 nm to in-plane at 0.4 nm to fully anisotropic at 1.0 nm. This illustrated that a fully granular magnetic Co-layer structure (t(Co) = 0.2 nm) transforms into discontinuous layered one (t(Co) = 0.4 nm) due to coalescence of suparparamagnetic regions to a continuous ferromagnetic layer (t(Co) = 1 nm).
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Publisher |
Elsevier
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Date |
2013-02
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Type |
Article
PeerReviewed |
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Format |
application/pdf
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Identifier |
http://npl.csircentral.net/3140/1/Magnetic%20and%20magnetoresistance.pdf
Ghosh, Subir Kumar and Chowdhury, Prashanta and Dogra, Anjana (2013) Magnetic and magnetoresistance studies of the evolution of the magnetic layer structure with Co layer thickness in electrodeposited Co-Cu/Cu multilayers. Journal of Magnetism and Magnetic Materials, 327. pp. 121-124. ISSN 0304-8853 |
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Relation |
http://npl.csircentral.net/3140/
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