Characteristics of brush plated ZnS films
IR@CECRI: CSIR-Central Electrochemical Research Institute, Karaikudi
View Archive Info| Field | Value | |
| Title |
Characteristics of brush plated ZnS films
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| Creator |
Murali, K.R.
Kumaresan, S. |
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| Subject |
Electrochemical Materials Science
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| Description |
Zinc sulphide(ZnS) thin films were deposited by the brush electrodeposition technique at
80°C and at different deposition current densities in the range of 80 – 200 mA cm-2.The
films were polycrystalline with peaks corresponding to single phase cubic ZnS. Films with
direct band gap in the range of 3.79–3.93 eV were obtained. The grain size increased from
20 – 70 nm as the deposition current density increased. The films exhibited resistivity in
the range of 100 – 1000 ohm cm. The photooutput obtained with photoelectrochemical
cells employing these films was higher than the previous report.
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| Publisher |
National Institute of Materials Physics
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| Date |
2009
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| Type |
Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://cecri.csircentral.net/285/1/022-2009.pdf
Murali, K.R. and Kumaresan, S. (2009) Characteristics of brush plated ZnS films. Chalcogenide Letters, 6 (1). pp. 17-22. ISSN 1584-8663 |
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| Relation |
http://cecri.csircentral.net/285/
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