High temperature grown transition metal oxide thin films: tuning physical properties by MeV N+-ion bombardment
IR@CECRI: CSIR-Central Electrochemical Research Institute, Karaikudi
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| Title |
High temperature grown transition metal oxide thin films: tuning physical properties by MeV N+-ion bombardment
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| Creator |
Sivakumar, R.
Sanjeeviraja, C. Jayachandran, M. Gopalakrishnan, R. Sarangi, S.N. Paramanik, D. Som, T. |
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| Subject |
Electrochemical Materials Science
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| Description |
In this paper, we present a systematic study on tuning the physical properties of high
temperature (373 K) grown transition metal oxide thin films by the effect of 2MeV nitrogen
ion irradiation. Although we observe irradiation induced growth in crystallite sizes for both
WO3 and MoO3 films, no structural phase change takes place in the films due to N+-ion beam
irradiation even up to the fluence of 1 × 1015 N+ cm−2. On the other hand, irradiation leads to
a significant increase in the optical absorption and the surface roughness of the films. These
observations are corroborated by micro-Raman analysis. The results are attributed to the MeV
ion–matter interaction.
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| Publisher |
IOP Publishing Ltd.
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| Date |
2008
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| Type |
Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://cecri.csircentral.net/370/1/111-2008.pdf
Sivakumar, R. and Sanjeeviraja, C. and Jayachandran, M. and Gopalakrishnan, R. and Sarangi, S.N. and Paramanik, D. and Som, T. (2008) High temperature grown transition metal oxide thin films: tuning physical properties by MeV N+-ion bombardment. Journal of Physics D: Applied Physics, 41 (12). ISSN 0022-3727 |
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| Relation |
http://cecri.csircentral.net/370/
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