Effect of substrate roughness on growth of diamond by hot filament CVD
IR@CGCRI: CSIR-Central Glass and Ceramic Research Institute, Kolkata
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| Title |
Effect of substrate roughness on growth of diamond by hot filament CVD
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| Creator |
Mallik, Awadesh Kumar
Binu, S R Satapathy, L N Narayana, Chandrabhas Seikh, Md Motin Shivashankar, S A Biswas, S K |
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| Subject |
Microstructure and Characterization
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| Description |
Polycrystalline diamond coatings are grown on Si (100) substrate by hot filament CVD technique. We investigate here the effect of substrate roughening on the substrate temperature and methane concentration required to maintain high quality, high growth rate and faceted morphology of the diamond coatings. It has been shown that as we increase the substrate roughness from 0.05 mu m to 0.91 mu m (centre line average or CLA) there is enhancement in deposited film quality (Raman peak intensity ratio of sp (3) to non-sp (3) content increases from 1.65 to 7.13) and the substrate temperature can be brought down to 640A degrees C without any additional substrate heating. The coatings grown at adverse conditions for sp (3) deposition has cauliflower morphology with nanocrystalline grains and coatings grown under favourable sp (3) condition gives clear faceted grains.
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| Publisher |
Indian Academy of Science
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| Date |
2010-06
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| Type |
Article
PeerReviewed |
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| Format |
application/pdf
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| Identifier |
http://cgcri.csircentral.net/810/1/awadesh2'10.pdf
Mallik, Awadesh Kumar and Binu, S R and Satapathy, L N and Narayana, Chandrabhas and Seikh, Md Motin and Shivashankar, S A and Biswas, S K (2010) Effect of substrate roughness on growth of diamond by hot filament CVD. Bulletin of Materials Science, 33 (3). pp. 251-255. ISSN 0250-4707 |
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| Relation |
http://cgcri.csircentral.net/810/
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