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Cu-Au-Ag Alloy Nanoparticles Incorporated Silica Films Using a New Three-Layer Deposition Technique

IR@CGCRI: CSIR-Central Glass and Ceramic Research Institute, Kolkata

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Title Cu-Au-Ag Alloy Nanoparticles Incorporated Silica Films Using a New Three-Layer Deposition Technique
 
Creator Pal, Sudipto
Bysakh, Sandip
De, Goutam
 
Subject Engineering Materials
 
Description Formation of Au-Ag-Cu ternary alloy nanoparticles (NPs) is difficult mainly because the system Cu/Ag is immiscible. We present a new synthetic technique to generate such ternary alloy NPs in silica film matrix employing a three-layer (3L) coating design. In this methodology three successive coating layers were deposited on silica glass substrates from separately prepared Cu-, Au- and Ag- ion incorporated inorganic-organic hybrid silica sols by dipping method. The Au layer is kept in the middle because it is miscible with both the Ag and Cu. The 3L film assembly was subjected to UV- and heat-treatment at 450-750 degrees C in H(2)-N(2) atmosphere. UV-treatment generates small Au and Ag NPs in the respective layers and Cu remains as Cu(2+); subsequent heat-treatment in H(2)-N(2) induces the formation of ternary alloy NPs by the interlayer diffusion of nanometals. The final heat-treated film (750 degrees C/H(2)-N(2)) shows single and sharp plasmon band centered at 480 nm in the UV-visible spectrum indicating the formation of alloy (solid solution) NPs. GIXRD study shows one set of diffraction peaks which are shifted towards higher angle with respect to the Au or Ag diffraction peaks. FESEM, GIXRD, HRTEM, and SAED analyses reveal that the alloy has a composition close to (Au+Ag)(0.88)Cu(0.12). The EDS analyses using the nano probe attached with TEM confirm the presence of Au, Ag and Cu in all the alloy NPs.
 
Publisher American Scientific Publishers
 
Date 2010-02
 
Type Article
PeerReviewed
 
Format application/pdf
 
Identifier http://cgcri.csircentral.net/850/1/sudipto2'10.pdf
Pal, Sudipto and Bysakh, Sandip and De, Goutam (2010) Cu-Au-Ag Alloy Nanoparticles Incorporated Silica Films Using a New Three-Layer Deposition Technique. Journal of Nanoscience and Nanotechnology , 10 (2). pp. 775-783. ISSN 1533-4880
 
Relation http://cgcri.csircentral.net/850/