Role of substrate temperature on the structural, optoelectronic and morphological properties of (400) oriented indium tin oxide thin films deposited using RF sputtering technique
IR@CECRI: CSIR-Central Electrochemical Research Institute, Karaikudi
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Title |
Role of substrate temperature on the structural, optoelectronic
and morphological properties of (400) oriented indium tin oxide
thin films deposited using RF sputtering technique
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Creator |
Malathy, V.
Sivaranjani, S. Vidhya, V.S. Balasubramanian, T. Josephprince, J. Sanjeeviraja, C. Jayachandran, M. |
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Subject |
Electrochemical Materials Science
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Description |
RF sputtering process has been used to deposit
highly transparent and conducting films of tin-doped
indium oxide onto quartz substrates keeping the RF power
constant at 250 W. The electrical, optical and structural
properties have been investigated as a function of substrate
temperature. XRD has shown that deposited films are
polycrystalline and have (400) preferred orientation.
Indium tin oxide layers with low resistivity values and high
transmittance in the visible region have been deposited.
Detailed Analyses based on X-ray diffraction, optical and
electrical results are attempted to gain more insight into the
factors that are governed by the influence of varying substrate
temperature in this investigation. AFM pictures
showed uniform surface morphology with very low surface
roughness values. It has been observed that ITO films
deposited in this study, keeping the substrate temperature at
150 degree C, can provide the required optimum electrical and
optical properties rendering them useful for developing
many optoelectronic devices at a moderate temperature.
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Publisher |
Springer Science+Business Media, LLC
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Date |
2010
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Type |
Article
PeerReviewed |
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Format |
application/pdf
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Identifier |
http://cecri.csircentral.net/447/1/2010-091.pdf
Malathy, V. and Sivaranjani, S. and Vidhya, V.S. and Balasubramanian, T. and Josephprince, J. and Sanjeeviraja, C. and Jayachandran, M. (2010) Role of substrate temperature on the structural, optoelectronic and morphological properties of (400) oriented indium tin oxide thin films deposited using RF sputtering technique. Journal of Materials Scienc, 21. pp. 1299-1307. |
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Relation |
http://cecri.csircentral.net/447/
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