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Role of substrate temperature on the structural, optoelectronic and morphological properties of (400) oriented indium tin oxide thin films deposited using RF sputtering technique

IR@CECRI: CSIR-Central Electrochemical Research Institute, Karaikudi

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Title Role of substrate temperature on the structural, optoelectronic and morphological properties of (400) oriented indium tin oxide thin films deposited using RF sputtering technique
 
Creator Malathy, V.
Sivaranjani, S.
Vidhya, V.S.
Balasubramanian, T.
Josephprince, J.
Sanjeeviraja, C.
Jayachandran, M.
 
Subject Electrochemical Materials Science
 
Description RF sputtering process has been used to deposit highly transparent and conducting films of tin-doped indium oxide onto quartz substrates keeping the RF power constant at 250 W. The electrical, optical and structural properties have been investigated as a function of substrate temperature. XRD has shown that deposited films are polycrystalline and have (400) preferred orientation. Indium tin oxide layers with low resistivity values and high transmittance in the visible region have been deposited. Detailed Analyses based on X-ray diffraction, optical and electrical results are attempted to gain more insight into the factors that are governed by the influence of varying substrate temperature in this investigation. AFM pictures showed uniform surface morphology with very low surface roughness values. It has been observed that ITO films deposited in this study, keeping the substrate temperature at 150 degree C, can provide the required optimum electrical and optical properties rendering them useful for developing many optoelectronic devices at a moderate temperature.
 
Publisher Springer Science+Business Media, LLC
 
Date 2010
 
Type Article
PeerReviewed
 
Format application/pdf
 
Identifier http://cecri.csircentral.net/447/1/2010-091.pdf
Malathy, V. and Sivaranjani, S. and Vidhya, V.S. and Balasubramanian, T. and Josephprince, J. and Sanjeeviraja, C. and Jayachandran, M. (2010) Role of substrate temperature on the structural, optoelectronic and morphological properties of (400) oriented indium tin oxide thin films deposited using RF sputtering technique. Journal of Materials Scienc, 21. pp. 1299-1307.
 
Relation http://cecri.csircentral.net/447/